Niobium
Sputtering TargetTa<30 ppm
Size
344.35 mm dia x 8.6 mm th.
EINECS Number
231-113-5
Quantity Available
pcs
CAS Number
7440-03-1
Status
Product ID
SPNB344D8T4N5
Hazmat
Powder: 4.1 PGIII UN3089
Catalog Number
9226
Description
AMAT Endura target.
Comments
SMITY in stock
Niobium is used as a critical alloying element in superalloys for jet engines and heat-resistant equipment, as well as in high-strength low-alloy (HSLA) steels.
Niobium sputtering targets are utilized to create thin films for microelectronic components, surface acoustic wave filters, and superconducting layers.
Niobium and its oxides are deposited via evaporation or sputtering to create high-refractive-index layers in optical interference filters and anti-reflective coatings.
High-purity niobium pellets and wire are used as evaporation materials in physical vapor deposition processes to form superconducting thin films.
Due to its high melting point and resistance to corrosion, niobium is classified as a refractory metal used in chemical processing equipment and high-temperature vacuum furnaces.
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