Nickel Oxide, Sputtering Target, 99.95%, 500 mm x 106 mm x 6.35 mm th.

Nickel oxide is used as a sputtering target material to deposit thin films for electrochromic devices, gas sensors, and p-type transparent conducting layers.

Nickel oxide serves as a precursor or additive in the synthesis of lithium nickel manganese cobalt oxides (NMC) and other cathode active materials for lithium-ion batteries.

NiO nanoparticles are synthesized for use in high-surface-area catalysis, magnetic materials, and as components in advanced ceramic composites.

Thin films of NiO are applied via vacuum deposition for use in optical filters and as functional layers in smart window technologies.