Antimony, Sputtering Target, 99.999%, 3 inch dia x 0.250 inch th.

Antimony is used as an n-type dopant in silicon wafers and is a critical component in the production of III-V compound semiconductors such as indium antimonide for infrared detectors.

Antimony is added to lead and other metals to increase hardness and mechanical strength, commonly used in lead-acid batteries and solder alloys.

High-purity antimony sputtering targets are utilized to deposit thin films for phase-change memory (PRAM) and optical data storage applications.

Antimony is used as an evaporation source in physical vapor deposition processes to create thin films for microelectronic and optical devices.