Silicon Nitride, Sputtering Target, 99.5%, 300 mm dia x 8.5 mm th.

Silicon nitride is used as a passivation layer, diffusion mask, and dielectric material in integrated circuit manufacturing due to its excellent barrier properties against water and sodium ions.

Silicon nitride targets are utilized in physical vapor deposition to create hard, wear-resistant, and chemically inert thin films for microelectronic and optical applications.

Due to its high thermal stability and resistance to thermal shock, silicon nitride is used in high-stress refractory components such as crucible liners and engine parts.

It is applied as an anti-reflective coating and a protective layer in optical devices and solar cells because of its tunable refractive index and durability.

Silicon nitride nanopowders are used to produce high-strength nanocomposites and specialized ceramic components with enhanced mechanical properties.