Tantalum Pentoxide, Sputtering Target, 99.999%, 200 mm dia x 6.35 mm th.

Tantalum pentoxide is used as a sputtering target material to create high-refractive-index thin films for interference filters and anti-reflective coatings.

Utilized in multilayer optical coatings due to its high refractive index, low absorption, and wide transparency range from near-UV to IR.

Used as a source material in physical vapor deposition processes to produce dielectric layers for capacitors and optical components.

Applied as a high-k dielectric material in the fabrication of dynamic random-access memory (DRAM) capacitors and gate insulators.