Tantalum Carbide, Sputtering Target, 99.5%, 3 inch dia x 0.25 inch th.

Tantalum carbide is used as a sputtering target material to create hard, wear-resistant, and chemically stable thin films for cutting tools and microelectronic diffusion barriers.

Due to its extremely high melting point and thermal stability, TaC is utilized in the production of refractory components for aerospace and high-temperature furnace linings.

TaC is frequently added to tungsten carbide-based cemented carbides to improve the oxidation resistance, hardness, and performance of cutting tools at high temperatures.

TaC powders are used in thermal spray processes to provide protective coatings that resist erosion, corrosion, and extreme thermal stress.