Tantalum Suboxide, Sputtering Target, 99.995%, 2 inch dia x 0.125 inch th.

Tantalum suboxide is utilized as a sputtering target material to create thin films with specific refractive indices and oxygen deficiencies for optical and electronic applications.

Used in the deposition of high-refractive index layers where controlled stoichiometry of the tantalum oxide film is required for interference filters.

Acts as a source material for physical vapor deposition processes to produce oxygen-depleted tantalum oxide coatings.