Tantalum Silicide
Sputtering TargetTantalum Silicide, Sputtering Target, 99.9%, 13 inch dia x 0.350 inch th.
Product Specifications
Chemical Name
Chemical Formula
Purity
99.9%
Composition
Size
13 inch dia x 0.350 inch th.
EINECS Number
234-902-2
Quantity Available
pcs
CAS Number
12039-79-1
Status
Product ID
SPTASI213D0T3N
Hazmat
Catalog Number
4680
Description
Comments
Microelectronics grade
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Element Name
Tantalum Silicide
Symbol
TaSi2
Atomic Number
-
Atomic Weight
237.12 g/mol
Melting Point
2200 °C
Boiling Point
-
Density
9.14 g/cm³
Crystal Structure
Hexagonal
Color / Appearance
Gray metallic powder
Thermal Conductivity
-
Electrical Resistivity
8.5 - 50 µΩ·cm
Coefficient of Thermal Expansion
8.8 x 10^-6 /K
Electronegativity
-
Neutron Cross Section
-
Electron Configuration
-
This Product
SPTASI213D0T3N
Form
Sputtering Target
Purity
99.9%
Composition
-
Size
13 inch dia x 0.350 inch th.
Quantity Available
pcs
Catalog Number
4680
info
Semiconductors
Used as a conductive material for gates and interconnects in integrated circuits due to its high temperature stability and low resistivity.
info
Sputtering
Fabricated into sputtering targets for the deposition of thin films used in microelectronics and protective coatings.
info
Refractory chemicals
Utilized in high-temperature environments due to its excellent oxidation resistance and high melting point.
warning
HazMat Classification
Not classified as hazardous material.
description
Documentation
Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.
local_shipping
Shipping
Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.
verified
Quality Assurance
All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.
description
Certificates of Analysis (COA)
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