Titanium, Sputtering Target, 99.995%, 60 mm dia x 1 mm th.

Titanium sputtering targets are used to create thin films for wear-resistant coatings, decorative finishes, and semiconductor barrier layers.

Titanium is a primary alloying element used to increase the strength, heat resistance, and corrosion resistance of steel, aluminum, and vanadium alloys.

Spherical titanium powder is a standard material for additive manufacturing processes like Selective Laser Melting (SLM) and Electron Beam Melting (EBM) for aerospace and medical implants.

Titanium is evaporated or sputtered to create high-refractive index layers and beam splitters in multilayer optical interference filters.

High-purity titanium pellets and wire are used as source materials in physical vapor deposition to form adhesion layers and electrodes.

Titanium powders are utilized in plasma spray and cold spray processes to provide biocompatible and corrosion-resistant surface coatings.