Titanium Boride, Sputtering Target, 99.5%, 1 inch dia x 0.125 inch th.

Titanium diboride is used as a sputtering target material to create hard, wear-resistant, and chemically stable thin films for cutting tools and microelectronic components.

Due to its high melting point and resistance to molten metals, TiB2 is used in the production of crucibles and evaporation boats for aluminum metallization.

TiB2 is a key component in composite ceramic evaporation boats used for the continuous vacuum evaporation of aluminum.

Used as a grain refiner in aluminum alloys to improve mechanical strength and structural integrity during solidification.