Titanium Nitride, Sputtering Target, 99.5%, MRC (4.75 inch x 14.875 inch x 0.250 inch th.)

Titanium nitride targets are used in physical vapor deposition (PVD) sputtering processes to create hard, wear-resistant, and decorative golden coatings on tools and consumer hardware.

Used as a diffusion barrier and gate electrode material in integrated circuit fabrication due to its high stability and low resistivity.

Applied as a thin film in optical stacks to provide specific reflectance properties and as a durable protective layer.

Utilized in thermal spray processes to provide surfaces with enhanced hardness, erosion resistance, and thermal stability.