Vanadium, Sputtering Target, 99.7%, MRC (4.75 inch x 14.875 inch x 0.250 inch th.)

Vanadium is a critical alloying element used to increase strength, toughness, and heat resistance in steel and titanium alloys for aerospace and industrial applications.

High-purity vanadium sputtering targets are used to deposit thin films for microelectronics, hard coatings, and decorative layers.

Vanadium pellets and pieces are used as evaporation materials in physical vapor deposition processes to create conductive or protective metallic coatings.

Due to its high melting point and resistance to corrosion, vanadium is utilized in the production of refractory materials and specialized high-temperature components.