Yttrium Oxide, Sputtering Target, 99.99%, 1 inch dia x 0.125 inch th.

Used as a starting material for synthesizing other yttrium compounds and as a stabilizing agent in zirconia ceramics.

Utilized as a high-purity sputtering target material for the deposition of thin films in optical and electronic applications.

Applied as a high-refractive index layer in multilayer optical coatings due to its transparency from UV to IR wavelengths.

Used in physical vapor deposition processes to create protective coatings and dielectric layers.

Employed in plasma spray coating processes to provide corrosion resistance and thermal insulation for semiconductor chamber components.

Used in the production of heat-resistant glass and ceramics that must withstand extreme temperatures without melting or reacting.