Yttrium Fluoride, Sputtering Target, 99.5%, 100 mm dia x 3 mm th.

Yttrium fluoride is used as a sputtering target material to create thin films that provide high-quality dielectric layers and protective coatings in vacuum environments.

Utilized as a low-refractive index material in multilayer optical coatings, particularly for UV and infrared applications due to its wide transparency range.

Used as a source material in physical vapor deposition processes to produce moisture-resistant and durable optical thin films.

Serves as an intermediate in the production of metallic yttrium through metallothermic reduction.