Chemical Name
Tantalum Silicide
Chemical Formula
TaSi2
Purity
99.8%
Composition
Size
-625 mesh ( 13 mic aps)
EINECS Number
234-902-2
Quantity Available
kg
CAS Number
12039-79-1
Status
Product ID
TASI2PO711749
Hazmat
Catalog Number
20269
Description
Comments
Microelectronics grade
Used as a conductive material for gates and interconnects in integrated circuits due to its high temperature stability and low resistivity.
Fabricated into sputtering targets for the deposition of thin films used in microelectronics and protective coatings.
Utilized in high-temperature environments due to its excellent oxidation resistance and high melting point.
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