Chemical Name
Aluminum Copper Alloy
Chemical Formula
AlCu
Purity
99.99%
Composition
98/2 wt%
Size
3 mm dia x 3 mm th.
EINECS Number
Quantity Available
kg
CAS Number
Status
Product ID
TPALCU3D3T04N-3
Hazmat
Not hazardous for transportation
Catalog Number
11204
Description
Comments
Aluminum-copper alloy sputtering targets are used to deposit thin-film interconnects in integrated circuits to improve electromigration resistance compared to pure aluminum.
Copper is added to aluminum as a primary alloying element to significantly increase strength and hardness through precipitation hardening, creating high-strength aerospace and structural materials.
Gas-atomized Al-Cu alloy powders are utilized in selective laser melting (SLM) and other additive manufacturing processes to produce lightweight, high-strength functional components.
Used in the metallization phase of semiconductor fabrication to create conductive paths and bond pads that are resistant to thermal and electrical stress.
Loading COA files…