Chemical Name
Tantalum
Chemical Formula
Ta
Purity
99.95%
Composition
Size
1 mm dia. x 1000 mm length
EINECS Number
231-135-5
Quantity Available
pcs/kg
CAS Number
7440-25-7
Status
Product ID
WRTA1CS0003N5
Hazmat
Powder: Class 4.1, UN3089, PG II
Catalog Number
5159
Description
Spool
Comments
High tensile, annealed, ASTM B365-98
Tantalum sputtering targets are used to create thin films for semiconductor barriers and high-performance capacitors.
Tantalum is used as an alloying element in superalloys for jet engine components to improve strength and corrosion resistance at high temperatures.
Due to its high melting point and chemical inertness, tantalum is utilized in the production of laboratory equipment and chemical reaction vessels.
Spherical tantalum powder is used in additive manufacturing to produce biocompatible medical implants and high-density aerospace components.
Tantalum is used in physical vapor deposition processes as a source material for coating optical and electronic components.
Tantalum and tantalum nitride serve as essential diffusion barriers between copper interconnects and silicon substrates in integrated circuits.
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