Chemical Name
Magnesium Fluoride
Chemical Formula
MgF2
Purity
99.5%
Composition
Size
-325 mesh
EINECS Number
Quantity Available
kg
CAS Number
7783-40-6
Status
50
Product ID
POMGF232502N5
Hazmat
Catalog Number
17944
Description
Ca, Na excluded
Comments
Magnesium fluoride is used as a sputtering target material to create durable, low-refractive index thin films for optical and microelectronic components.
Widely utilized as a low-index material for anti-reflective coatings on lenses and windows due to its wide transparency range from VUV to infrared.
Commonly used in thermal and electron-beam evaporation processes to deposit thin films for interference filters and beam splitters.
Applied via electron-beam evaporation to produce high-quality, stoichiometric thin films for precision optical applications.
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