Chemical Name
Titanium Silicide
Chemical Formula
TiSi2
Purity
99.5%
Composition
Size
-400 mesh (7.53 mic aps)
EINECS Number
234-904-3
Quantity Available
kg
CAS Number
12039-83-7
Status
50 kg
Product ID
POTISI24002N5
Hazmat
Powder: Class 4.1, UN3178, PG III
Catalog Number
8099
Description
Comments
inred XRD and PSD report available upon request, minor phase of Ti5Si3 and Si present
Titanium silicide is widely used as a contact material and for interconnects in CMOS fabrication due to its low electrical resistivity and high thermal stability.
Used as a sputtering target material to deposit thin films for microelectronic circuits and protective coatings.
Utilized for its high melting point and oxidation resistance in high-temperature structural applications and coatings.
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