Chemical Name
Titanium Silicide
Chemical Formula
TiSi2
Purity
99.5%
Composition
Size
-625 mesh (5 mic aps) approx
EINECS Number
234-904-3
Quantity Available
kg
CAS Number
12039-83-7
Status
Product ID
POTISI26252N5
Hazmat
Powder: Class 4.1, UN3178, PG III
Catalog Number
15013
Description
Classified
Comments
inred XRD and PSD report available upon request, minor phase of Ti5Si3 and Si present
Titanium silicide is widely used as a contact material and for interconnects in CMOS fabrication due to its low electrical resistivity and high thermal stability.
Used as a sputtering target material to deposit thin films for microelectronic circuits and protective coatings.
Utilized for its high melting point and oxidation resistance in high-temperature structural applications and coatings.
Loading COA files…