Magnesium Fluoride, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Magnesium fluoride is used as a sputtering target material to create durable, low-refractive index thin films for optical and microelectronic components.

Widely utilized as a low-index material for anti-reflective coatings on lenses and windows due to its wide transparency range from VUV to infrared.

Commonly used in thermal and electron-beam evaporation processes to deposit thin films for interference filters and beam splitters.

Applied via electron-beam evaporation to produce high-quality, stoichiometric thin films for precision optical applications.