Aluminum oxide is widely used as a technical ceramic in components that require hardness, wear resistance, and chemical stability. It is commonly applied in components such as seals, substrates, and protective parts.1 In microelectronics, Al2O3 is used as a dielectric and passivation material in semiconductor devices, where it provides electrical insulation and contributes to device reliability.2 In optical and protective systems, aluminum oxide is applied in thin film coatings primarily as a durable protective layer for optical components.3 Al2O3 also plays an important role in catalysis and catalyst support applications, where thermally stable oxide surfaces are required for chemical and materials processing.4 Al2O3 is also available in α, β, and γ phases, which differ in structure and surface characteristics, allowing selection of the appropriate forms for structural or catalytic applications.1,4
Additional Documents
References:
1. Kingery, W. D.; Bowen, H. K.; Uhlmann, D. R. Introduction to Ceramics, 2nd ed.; Wiley, 1976.
2. Robertson, J. “High dielectric constant oxides,” Reports on Progress in Physics, 69 (2006) 327–396.
3. Pulker, H. K., Coatings on Glass, Elsevier, 1999.
4. Busca, G. “The surface of transitional aluminas: A critical review,” Catalysis Today, 226 (2014) 2–13.
| Product ID | Description | Compare | expand | |
| TPAL2O310D10T4N | Pellets | 10 mm dia x 10 mm th. | 99.99% |
| Product ID | Description | Compare | expand | |
| GPAL2O313004N | Pieces | 1 -3 mm | Clear, mono-crystal sapphire | 99.99% | |||
| GPAL2O33124N5 | Pieces | 3 -12 mm | 99.995% | |||
| GPAL2O31304N5 | Pieces | 1 -3 mm | 99.995% | |||
| GPAL2O31304N5-1 | Pieces | 1 -3 mm | 99.995% |
| Product ID | Description | Compare | expand | |
| SPAL2O33D3T4N5 | Sputtering Target | 3 inch dia x 0.125 inch th. | 99.995% | |||
| SPAL2O36D3T4N5 | Sputtering Target | 6 inch dia x 0.125 inch th. | 99.995% | |||
| SPAL2O34D3T4N5 | Sputtering Target | 4 inch dia x 0.125 inch th. | 99.995% | |||
| SPAL2O34D6T4N5 | Sputtering Target | 4 inch dia x 0.25 inch th. | 99.995% | |||
| SPAL2O314D6T4N5 | Sputtering Target | 14 inch dia x 0.25 inch th. | 99.995% | |||
| Product ID | Description | Compare | expand | |
| FOAL2O310010014N | Foil | 100 mm x 100 mm x 1 mm | 99.99% | |||
| FOAL2O3505014N | Foil | 50 mm x 50 mm x 1 mm | 99.99% | |||
| FOAL2O3252514N | Foil | 25 mm x 25 mm x 1 mm | 99.99% |
| Product ID | Description | Compare | expand | |
| POAL2O300003N | Powder | 10 -30 micron | Spray grade | 99.9% | |||
| POAL2O312504N | Powder | -1250 mesh | 99.99% | |||
| POAL2O36008004N | Powder | 600 -800 nm | Nano | 99.99% | |||
| POAL2O340003N | Powder | -400 mesh (20.73 mic aps) approx | Spherical | 99.9% | |||
| POAL2O348004N | Powder | -4800 mesh (< 1.3 mic aps) approx | 99.99% | |||
| Product ID | Description | Compare | expand | |
| BEAL2O31304N5 | Beads | 1 -3 mm | 99.995% |
| Product ID | Description | Compare | expand | |
| RCAL2O3301823N | Ring | 30 mm OD x 18 mm ID x 2 mm th. | 99.9% |
| Product ID | Description | Compare | expand | |
| DKAL2O38864N5 | Disk | 88 mm dia. x 6 mm th. | Double side polish <0001> | 99.995% | |||
| DKAL2O38884N5 | Disk | 88 mm dia. x 8 mm th. | non-conductive | 99.995% | |||
| DKAL2O388104N5 | Disk | 88 mm dia. x 10 mm th. | Double side polish <0001> | 99.995% | |||
| DKAL2O388104N5-1 | Disk | 88 mm dia. x 10 mm th. | non-conductive | 99.995% | |||
| DKAL2O38864N5-1 | Disk | 88 mm dia. x 6 mm th. | non-conductive | 99.995% | |||
