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Silicon Dioxide

Synonym(s): Silica, Glass, Quartz, Silicon(IV) Oxide, 7631-86-9, 60676-86-0
Empirical Formula: SiO2
HazMat: Not hazardous for transportation
CAS No.: 14808-60-7
EINECS No.: 238-878-4
Tags: Infrared Optical Materials Optics-UV Medical Semiconductor TFT Display Crystal Growth Excimer Laser DUV Oxide Ceramics Specialty Inorganics Alloys 3D Printing Evaporation Deposition Materials Optical Coating Materials

Silicon dioxide is a foundational material in semiconductor manufacturing, where it used as an insulation, passivation, and interlayer dielectric in integrated devices.¹ In optical coating systems, SiO₂ is used in thin-film coating stacks to control reflection and transmission in ultraviolet, visible, and infrared components.^2,3 SiO₂ thin films are widely deposited by thermal oxidation, chemical vapor deposition, and physical vapor deposition, enabling compatibility with both microelectronics and optical fabrication workflows.⁴ Beyond electronics and optics, high-purity silicon dioxide is widely used in specialty inorganic applications, including crystal growth environments, ceramic processing, and chemically stable barrier layers.⁵

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	Product ID	Description	Compare	expand
	GRSIO2140005N	Granules \| 1 mm -4 mm \| Crystalline \| 99.999%

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Additional Documents

References:

Sze, S. M.; Ng, K. K., Physics of Semiconductor Devices, 3rd ed., Wiley, 2007.
Macleod, H. A., Thin Film Optical Filters, 4th ed., CRC Press, 2010.
Kaiser, N.; Pulker, H. K.,Optical Interference Coatings, Springer, 2003.
Ohring, M., Materials Science of Thin Films, 2nd ed., Academic Press, 2002.
Shelby, J.E. Introduction to Glass and Technology, 2nd ed., Royal Society of Chemistry, Cambridge, 2005.

Product ID	Description	Compare	expand
GRSIO2140005N	Granules \| 1 mm -4 mm \| Crystalline \| 99.999%
GRSIO2140004N	Granules \| 1 mm -4 mm \| Crystalline \| 99.99%
GRSIO2360004N	Granules \| 3 mm -6 mm \| Crystalline \| 99.99%
GRSIO2612004N	Granules \| 6 mm -12 mm \| Amorphous \| 99.99%
GRSIO238004N5	Granules \| 3 mm -8 mm \| Crystalline \| 99.995%

Product ID	Description	Compare	expand
GRSIO2140005N	Granules \| 1 mm -4 mm \| Crystalline \| 99.999%
GRSIO2140004N	Granules \| 1 mm -4 mm \| Crystalline \| 99.99%
GRSIO2360004N	Granules \| 3 mm -6 mm \| Crystalline \| 99.99%
GRSIO2612004N	Granules \| 6 mm -12 mm \| Amorphous \| 99.99%
GRSIO238004N5	Granules \| 3 mm -8 mm \| Crystalline \| 99.995%

Product ID	Description	Compare	expand
POSIO2400004N	Powder \| -400 mesh (7 mic aps) \| 99.99%
POSIO2625004N	Powder \| -625 mesh (2.43 mic aps) \| 99.99%
POSIO2125003N-1	Powder \| -1250 mesh (7.25 mic aps) approx \| 99.9%
POSIO2325003N-1	Powder \| -325 mesh ( 16 mic aps) approx \| 99.9%
POSIO240004N5	Powder \| -40 mesh approx \| 99.995%

Product ID	Description	Compare	expand
POSIO2400004N	Powder \| -400 mesh (7 mic aps) \| 99.99%
POSIO2625004N	Powder \| -625 mesh (2.43 mic aps) \| 99.99%
POSIO2125003N-1	Powder \| -1250 mesh (7.25 mic aps) approx \| 99.9%
POSIO2325003N-1	Powder \| -325 mesh ( 16 mic aps) approx \| 99.9%
POSIO240004N5	Powder \| -40 mesh approx \| 99.995%

Product ID	Description	Compare	expand
SPSIO22D3T05N	Sputtering Target \| 2 inch dia x 0.125 inch th. \| 99.999%
SPSIO22D6T05N	Sputtering Target \| 2 inch dia x 0.25 inch th. \| 99.999%
SPSIO23D3T05N	Sputtering Target \| 3 inch dia x 0.125 inch th. \| RD~99% \| 99.999%
SPSIO23D6T05N	Sputtering Target \| 3 inch dia x 0.25 inch th. \| RD~99% \| 99.999%
SPSIO24D3T05N	Sputtering Target \| 4 inch dia x 0.125 inch th. \| 99.999%

Product ID	Description	Compare	expand
CISIO215CC04N	Conical Insert \| 15 cc \| 99.99%
CISIO240CC04N	Conical Insert \| 40 cc \| Optical grade \| 99.99%

Product ID	Description	Compare	expand
CISIO215CC04N	Conical Insert \| 15 cc \| 99.99%
CISIO240CC04N	Conical Insert \| 40 cc \| Optical grade \| 99.99%

Silicon Dioxide

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