Aluminum Oxide, Sputtering Target, 99.99%, 380 mm x 126 mm x 6 mm th.

Aluminum oxide targets are used in physical vapor deposition to create insulating thin films and protective dielectric layers on various substrates.

Used as a low-refractive index material for multilayer interference filters, anti-reflective coatings, and protective overcoats in optical systems.

Al2O3 is evaporated via electron beam to produce high-purity thin films for microelectronic and optical applications.

Applied as a plasma spray coating to provide wear resistance, electrical insulation, and thermal barrier protection to industrial components.

Utilized in the production of high-temperature crucibles, furnace linings, and ceramic insulators due to its high melting point and chemical stability.

Serves as a high-k dielectric material and substrate component in integrated circuit manufacturing and power electronics.

Produced as nanopowders for use in high-surface-area catalysts, reinforced polymer composites, and advanced polishing slurries.