High-purity hafnium oxide is used in optical coatings due to its high refractive index and transparency from the near ultra-violet to the infrared, supporting durable and functional optical layers. In microelectronics, HfO2 is a benchmark high-k dielectric used as a gate oxide in advanced integrated circuits, where its high permittivity enables device scaling while maintaining compatibility with silicon processing. It is also applied in infrared and UV optical devices, including protective coatings and night-vision systems, where stable optical performance across a broad wavelength range is required. In energy technologies, HfO2 coatings are incorporated into solar cell structures to improve optical behavior and durability. Laser-based processing methods use hafnium oxide as a target and thin-film material for producing coatings and nanostructures, taking advantage of its wide bandgap, thermal robustness, and resistance to laser-induced damage.1
Note: Sputtering targets may contain reduction spots.
Additional Documents
References:
M. Dhanunjaya et al., “Hafnium oxide nanoparticles fabricated by femtosecond laser ablation in water,” Applied Physics A, 125, 74 (2019)
| Product ID | Description | Compare | expand | |
| GRHFO214003N5 | Granules | 1 mm -4 mm | (Zr<0.5%) | White | 99.95% | |||
| GRHFO2130004N | Granules | 1 mm -3 mm | (Zr<0.25%) | White | 99.99% | |||
| GRHFO214003N5-1 | Granules | 1 mm -4 mm | (Zr<0.5%) | Black | 99.95% | |||
| GRHFO2140004N-4 | Granules | 1 mm -4 mm | (Zr<0.2%) | Black | 99.99% | |||
| GRHFO261203N5 | Granules | 6 mm -12 mm | Zr<0.18wt% | black, DUV grade | 99.95% | |||
| Product ID | Description | Compare | expand | |
| SPHFO2151514N | Sputtering Target | 15 mm x 15 mm x 1 mm th. | Squares, sintered, optically polished | 99.99% | |||
| SPHFO28D6T3N5 | Sputtering Target | 8 inch dia x 0.25 inch th. | (Zr<0.46%) | 99.95% | |||
| SPHFO26D6T3N5 | Sputtering Target | 6 inch dia x 0.25 inch th. | (Zr<0.2%) | 99.95% | |||
| SPHFO24D6T3N5 | Sputtering Target | 4 inch dia x 0.25 inch th. | (Zr<0.3%) | 99.95% | |||
| SPHFO22D3T3N5 | Sputtering Target | 2 inch dia x 0.125 inch th. | (Zr<0.0078%) | Gray | 99.95% | |||
| Product ID | Description | Compare | expand | |
| ROHFO210D10T4N5 | Rod | 10 mm dia x 10 cm length | s, sintered, optically polished | 99.995% |
| Product ID | Description | Compare | expand | |
| TPHFO218D12T3N5-3 | Pellets | 18 mm dia x 12 mm th. | Zr <0.5% | Black pellets. | 99.95% | |||
| TPHFO210D10T4N5 | Pellets | 10 mm dia x 10 mm th. | Zr~1250 ppm | 99.995% | |||
| TPHFO218D6T4N-6 | Pellets | 18 mm dia x 6 mm th. | (Zr<0.32 wt%) | White | 99.99% | |||
| TPHFO218D6T4N5-5 | Pellets | 18 mm dia x 6 mm th. | Zr <0.32% excluded | Beige | 99.995% |
| Product ID | Description | Compare | expand | |
| CIHFO215CC04N | Conical Insert | 15 cc | Zr<0.3% | Starter source | 99.99% | |||
| CIHFO215CC04N-1 | Conical Insert | 15 cc | Zr<0.5% | Starter source | 99.99% | |||
| CIHFO213CC04N | Conical Insert | 13 cc | (Starter source) | 99.99% | |||
| CIHFO225CC3N5 | Conical Insert | 25 cc | (Starter source) | 99.95% | |||
| CIHFO240CC04N | Conical Insert | 40 cc | 99.99% | |||
| Product ID | Description | Compare | expand | |
| POHFO232504N5 | Powder | -325 mesh | Zr<800 ppm excluded | 99.995% | |||
| POHFO227003N5 | Powder | -270 mesh ( 20 mic aps) approx | Zr<1000ppm | 99.95% | |||
| POHFO2325004N-4 | Powder | -325 mesh approx | Zr <0.15 wt% | white | 99.99% | |||
| POHFO2480013N | Powder | -4800 mesh ( 1 aps) micron | Zr<1 wt% | Nanoparticles | 99.9% | |||
| HFO2PO906885 | Powder | -325 mesh approx | Zr <100 ppm excluded | white | 99.99% | |||
